XPSGeometry ®

XPSGeometry ® is a software for:
Characterizing the multilayer composition of nanofilms from ARXPS data. Characterizing the equipment-related geometrical factors affecting the intensity in XPS instruments.

Related links:
Instrument-related geometrical factors affecting the intensity in XPS and ARXPS experiments.A. Herrera-Gomez, F.S. Aguirre-Tostado, P.G. Mani-Gonzalez, M. Vazquez- Lepe , A. Sanchez-Martinez, O. Ceballos -Sanchez, R.M. Wallace, G. Conti and Y. Uritsky . J. Electron Spectrosc . Relat . Phenom . 184 (2011) 487500.

Characterization of geometrical factors for quantitative angle-resolved photoelectron spectroscopy. E. Martinez, A. Herrera-Gomez, M. Allain , O. Renault, A. Faure, A. Chabli , and F. Bertin . J. Vac. Sci. Technol. A 30, p. 040605 (2012).

Self consistent ARXPS analysis for multilayer conformal films with abrupt interfaces.Alberto Herrera-Gomez. Internal Report (Created: 1/2008. Last Update: 8/2008).

Please request a copy of XPSGeometry to xpsgeomety @ rdataa.com